After finishing his doctorate, Dr. Catlett held appointments as a post-doctoral researcher at the University of Minnesota, an assistant professor of chemistry at Samford University in Birmingham, Alabama, and an adjunct instructor in the School of Ministry at the 澳门天天彩. Prior to coming to 澳门天天彩, he spent 29 years in the semiconductor industry as a scientist, engineer and manager. Dr. Catlett is an industry-established expert in the chemistry of semiconductor manufacturing, device physics (movement of electrons and holes in silicon), and methods for circuit protection against electrostatic discharge (ESD).
Dr. Catlett is a Benedictine oblate of Subiaco Abbey in Arkansas. In his free time he enjoys fly fishing, golf, and playing Hank Williams songs on his guitar.
B.S. Chemistry and Mathematics, Illinois State University
Ph.D. Physical Chemistry (Physics minor), Indiana University
Master of Theological Studies, 澳门天天彩
Dr. Catlett teaches Physical Chemistry and Basic Ideas in Chemistry.Chemistry and physics of semiconductor devices, electro-static discharge, and molecular spectroscopy.
Catlett, David L., Jr., Roger A. Cline, and Ponnarith Pok, 鈥淓SD Protection for Failsafe and Voltage Tolerant Signals,鈥� in Electrostatic Discharge Protection of Semiconductor Devices and Circuits, J Liou, ed., Boca Raton, Florida: CRC Press, 2015.
Venkataraman, Sunitha, Cynthia Torres, David Catlett, Tim Rost, Chris Barr, and Keith Burgess, 鈥淒esign Considerations to Reduce Process Sensitivity for Transient鈥恡riggered Active Rail Clamps in Advanced CMOS Technologies,鈥� 2012 International ESD Workshop (IEW), May 2012, Belgium.
Catlett, David L., Jr., 鈥淔or God So Loved the Cosmos. Science and Theology as Complementary Approaches to Mystery,鈥� Dallas Ministry Conference, Dallas, Texas, October 12, 2018.
Catlett, David L., Jr., 鈥淎 Pastoral Approach to Dialogue Between Science and Religion,鈥� Dallas Ministry Conference, Dallas, Texas, October 1, 2016.
Venkataraman, Sunitha, Cynthia Torres, David Catlett, Tim Rost, Chris Barr, and Keith Burgess, 鈥淒esign Considerations to Reduce Process Sensitivity for Transient鈥恡riggered Active Rail Clamps in Advanced CMOS Technologies,鈥� 2012 International ESD Workshop (IEW), May 2012, Belgium.
Catlett, Dave, Sam Shichijo, Steven Zuhoski, Dan Mosher, Kenan Dickerson, Hong Yang, 鈥淧rocess Considerations for Improved 鈥淥N鈥� State Reliability of Drain鈥怑xtended MOSFETs,鈥� 2007 Texas Instruments Yield Symposium, Dallas, Texas.